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Effect of post-deposition treatments on the hydrogenation of hot-wire deposited amorphous silicon films
K. F. Feenstra, P. F. A. Alkemade, E. Algra, R. E. I. Schropp, W. F. van der WegVolume:
7
Year:
1999
Language:
english
Pages:
11
DOI:
10.1002/(sici)1099-159x(199909/10)7:53.0.co;2-4
File:
PDF, 167 KB
english, 1999