Ultralow nanoscale wear through atom-by-atom attrition in...

Ultralow nanoscale wear through atom-by-atom attrition in silicon-containing diamond-like carbon

Bhaskaran, Harish, Gotsmann, Bernd, Sebastian, Abu, Drechsler, Ute, Lantz, Mark A., Despont, Michel, Jaroenapibal, Papot, Carpick, Robert W., Chen, Yun, Sridharan, Kumar
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Volume:
5
Year:
2010
Language:
english
Pages:
5
DOI:
10.1038/nnano.2010.3
File:
PDF, 1.20 MB
english, 2010
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