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Investigation of profiles of implanted Ti atoms over the depth of boron nitride nanocrystalline ceramic exposed to high radiation doses and fluxes with subsequent annealing
S. M. Duvanov, V. A. BaturinVolume:
25
Language:
english
Pages:
3
DOI:
10.1134/1.1262574
Date:
August, 1999
File:
PDF, 33 KB
english, 1999