A comparative study of the atomic hydrogen penetration into thin vanadium films and silicon oxide-gallium arsenide structures
V. G. Bozhkov, V. A. Kagadei, D. I. Proskurovskii, L. M. Romas’Volume:
26
Language:
english
Pages:
3
DOI:
10.1134/1.1321241
Date:
October, 2000
File:
PDF, 45 KB
english, 2000