Features of the transport of sputtered atoms during...

Technical Physics Letters 2002 / 03 Vol. 28; Iss. 3

Features of the transport of sputtered atoms during Ta2O5film deposition onto substrates of complicated configuration

Yu. A. Bystrov, V. L. Laska, V. A. Vol’pyas, E. A. Govako, D. E. Timofeev, V. V. Troshkov
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Volume:
28
Language:
english
Pages:
3
DOI:
10.1134/1.1467265
Date:
March, 2002
File:
PDF, 45 KB
english, 2002
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