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Diffusion of As ions and self-diffusion in silicon during implantation
K. D. Demakov, V. A. Starostin, S. G. ShemardovVolume:
47
Language:
english
Pages:
4
DOI:
10.1134/1.1514818
Date:
October, 2002
File:
PDF, 47 KB
english, 2002