Redistribution of ytterbium and oxygen in annealing of silicon layers amorphized by implantation
O. V. Aleksandrov, Yu. A. Nikolaev, N. A. Sobolev, R. Asomoza, Yu. Kudriavtsev, A. Villegas, A. GodinesVolume:
37
Language:
english
Pages:
4
DOI:
10.1134/1.1634654
Date:
December, 2003
File:
PDF, 69 KB
english, 2003