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Low-power RF plasma sources for technological applications: II. plasma sources under anomalous skin effect conditions
K. V. Vavilin, V. Yu. Plaksin, Kh. M. Ri, A. A. RukhadzeVolume:
49
Language:
english
Pages:
5
DOI:
10.1134/1.1767875
Date:
June, 2004
File:
PDF, 75 KB
english, 2004