Removal of fluoropolimers from the surface of silicon...

Semiconductors 2005 / 11 Vol. 39; Iss. 11

Removal of fluoropolimers from the surface of silicon structures by treatment in an atomic hydrogen flow

E. V. Anishchenko, V. A. Kagadei, E. V. Nefedtsev, D. I. Proskurovskii, S. V. Romanenko
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Volume:
39
Language:
english
Pages:
4
DOI:
10.1134/1.2128463
Date:
November, 2005
File:
PDF, 155 KB
english, 2005
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