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Fine-line plasma-enhanced processes on the basis of a set of pilot units with a scalable inductively coupled plasma source for use in microelectronics
A. A. Orlikovsky, K. V. Rudenko, S. N. AverkinVolume:
40
Language:
english
Pages:
12
DOI:
10.1134/s0018143906030106
Date:
May, 2006
File:
PDF, 363 KB
english, 2006