Composition of plasma-chemical silicon dioxide films as...

High Energy Chemistry 2007 / 07 Vol. 41; Iss. 4

Composition of plasma-chemical silicon dioxide films as studied by IR spectroscopy

V. M. Izgorodin, I. M. Pronina, V. G. Gogolev, V. L. Yur’ev, A. Sh. Komarevskaya
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Volume:
41
Language:
english
Pages:
5
DOI:
10.1134/s001814390704011x
Date:
July, 2007
File:
PDF, 175 KB
english, 2007
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