Features of resist-free formation of masking pattern by electron beam-induced vapor deposition
M. A. Bruk, E. N. Zhikharev, S. L. Shevchuk, I. A. Volegova, A. V. Spirin, E. N. Teleshov, V. A. Kal’nov, Yu. P. MaishevVolume:
42
Language:
english
Pages:
6
DOI:
10.1134/s0018143908050056
Date:
September, 2008
File:
PDF, 297 KB
english, 2008