The direct resist-free deposition of a lithographic mask from vapor initiated by an electron beam
M. A. Bruk, E. N. Zhikharev, S. L. Shevchuk, I. A. Volegova, A. V. Spirin, E. N. Teleshov, V. A. Kal’nov, Yu. P. MaishevVolume:
82
Language:
english
Pages:
6
DOI:
10.1134/s0036024408100178
Date:
October, 2008
File:
PDF, 452 KB
english, 2008