Atomic force microscopy study of the degradation mechanism...

Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques 2007 / 02 Vol. 1; Iss. 1

Atomic force microscopy study of the degradation mechanism of ultrathin HfO2layers on silicon during vacuum annealing

A. S. Baturin, A. V. Zenkevich, Yu. Yu. Lebedinskii, N. Yu. Lyubovin, V. N. Nevolin, E. P. Sheshin
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
1
Language:
english
Pages:
6
DOI:
10.1134/s102745100701017x
Date:
February, 2007
File:
PDF, 218 KB
english, 2007
Conversion to is in progress
Conversion to is failed