![](/img/cover-not-exists.png)
Enhancing the dry-etch durability of photoresist masks: A review of the main approaches
S. V. Zelentsov, N. V. Zelentsova, A. N. Kolesov, L. A. Bogatyreva, I. A. MashtakovVolume:
36
Language:
english
Pages:
9
DOI:
10.1134/s1063739707010052
Date:
January, 2007
File:
PDF, 168 KB
english, 2007