Spectral study of HCl plasma etching of gallium arsenide

Russian Microelectronics 2011 / 11 Vol. 40; Iss. 6

Spectral study of HCl plasma etching of gallium arsenide

A. V. Dunaev, S. A. Pivovarenok, S. P. Kapinos, A. M. Efremov, V. I. Svettsov
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Volume:
40
Language:
english
Pages:
4
DOI:
10.1134/s1063739711060047
Date:
November, 2011
File:
PDF, 149 KB
english, 2011
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