Effect of boron ion implantation and subsequent anneals on the properties of Si nanocrystals
G. A. Kachurin, S. G. Cherkova, V. A. Volodin, D. M. Marin, D. I. Tetel’baum, H. BeckerVolume:
40
Language:
english
Pages:
7
DOI:
10.1134/s1063782606010131
Date:
January, 2006
File:
PDF, 214 KB
english, 2006