SiOxlayer formation during plasma sputtering of Si and SiO2targets
A. N. Karpov, D. V. Marin, V. A. Volodin, J. Jedrzejewski, G. A. Kachurin, E. Savir, N. L. Shwartz, Z. Sh. Yanovitskaya, I. Balberg, Y. GoldsteinVolume:
42
Language:
english
Pages:
6
DOI:
10.1134/s106378260806016x
Date:
June, 2008
File:
PDF, 233 KB
english, 2008