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Mechanism of local amorphization of a heavily doped Ti1 −xVxCoSb intermetallic semiconductor
V. A. Romaka, Yu. V. Stadnyk, L. G. Akselrud, V. V. Romaka, D. Fruchart, P. Rogl, V. N. Davydov, Yu. K. GorelenkoVolume:
42
Language:
english
Pages:
8
DOI:
10.1134/s1063782608070014
Date:
July, 2008
File:
PDF, 265 KB
english, 2008