Depth profiling of semiconductor structures by X-ray...

Semiconductors 2009 / 04 Vol. 43; Iss. 4

Depth profiling of semiconductor structures by X-ray microanalysis using the electron probe energy variation technique

L. A. Bakaleinikov, Ya. V. Domrachova, E. V. Kolesnikova, M. V. Zamoryanskaya, T. B. Popova, E. Yu. Flegontova
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Volume:
43
Language:
english
Pages:
6
DOI:
10.1134/s1063782609040265
Date:
April, 2009
File:
PDF, 194 KB
english, 2009
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