Low-temperature plasma pulsed deposition of thin films with...

Semiconductors 2009 / 06 Vol. 43; Iss. 6

Low-temperature plasma pulsed deposition of thin films with nanoscale periodicity of properties

A. A. Serdobintsev, A. G. Veselov, O. A. Kiryasova, S. A. Portnov, D. N. Bratashov
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Volume:
43
Language:
english
Pages:
4
DOI:
10.1134/s106378260906027x
Date:
June, 2009
File:
PDF, 156 KB
english, 2009
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