Effect of oxygen plasma on the properties of tantalum oxide...

Semiconductors 2010 / 09 Vol. 44; Iss. 9

Effect of oxygen plasma on the properties of tantalum oxide films

V. M. Kalygina, A. N. Zarubin, V. A. Novikov, Yu. S. Petrova, M. S. Skakunov, O. P. Tolbanov, A. V. Tyazhev, T. M. Yaskevich
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Volume:
44
Language:
english
Pages:
8
DOI:
10.1134/s1063782610090216
Date:
September, 2010
File:
PDF, 1.35 MB
english, 2010
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