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Development of dislocation-free ion-doped silicon layers
V. I. Plebanovich, A. I. Belous, A. R. Chelyadinskiĭ, V. B. OdzhaevVolume:
50
Language:
english
Pages:
5
DOI:
10.1134/s1063783408080088
Date:
August, 2008
File:
PDF, 340 KB
english, 2008