![](/img/cover-not-exists.png)
Formation of the buffer layer of silicon suboxides SiOxin the Si/SiO2low-dimensional heterosystem after Si+ion implantation: SiL2, 3X-ray emission spectra
D. A. Zatsepin, E. A. Panin, S. Kaschieva, H. -J. Fitting, S. N. ShaminVolume:
51
Language:
english
Pages:
6
DOI:
10.1134/s1063783409110079
Date:
November, 2009
File:
PDF, 193 KB
english, 2009