Thermal stability of thin amorphous Ta-Si-N films used in...

Technical Physics 2006 / 10 Vol. 51; Iss. 10

Thermal stability of thin amorphous Ta-Si-N films used in Au/GaN metallization

A. V. Kuchuk, V. P. Klad’ko, V. F. Machulin, A. Piotrowska
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Volume:
51
Language:
english
Pages:
3
DOI:
10.1134/s1063784206100227
Date:
October, 2006
File:
PDF, 213 KB
english, 2006
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