X-ray spectroscopic examination of thin HfO2films ALD- and...

Technical Physics 2010 / 07 Vol. 55; Iss. 7

X-ray spectroscopic examination of thin HfO2films ALD- and MOCVD-grown on the Si(100) surface

A. A. Sokolov, A. A. Ovchinnikov, K. M. Lysenkov, D. E. Marchenko, E. O. Filatova
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Volume:
55
Language:
english
Pages:
6
DOI:
10.1134/s1063784210070200
Date:
July, 2010
File:
PDF, 218 KB
english, 2010
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