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Aluminum nitride on silicon: Role of silicon carbide interlayer and chloride vapor-phase epitaxy technology
V. N. Bessolov, Yu. V. Zhilyaev, E. V. Konenkova, L. M. Sorokin, N. A. Feoktistov, Sh. Sharofidinov, M. P. Shcheglov, S. A. Kukushkin, L. I. Mets, A. V. OsipovVolume:
36
Language:
english
Pages:
4
DOI:
10.1134/s1063785010060039
Date:
June, 2010
File:
PDF, 373 KB
english, 2010