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Modifying of etching anisotropy of silicon substrates by surface active agents
Krzysztof P. Rola, Irena ZubelVolume:
9
Language:
english
Pages:
7
DOI:
10.2478/s11534-010-0114-9
Date:
April, 2011
File:
PDF, 1.55 MB
english, 2011