Influence of deposition temperature on amorphous structure of PECVD deposited a-Si:H thin films
Jarmila Müllerová, Marinus Fischer, Marie Netrvalová, Miro Zeman, Pavel ŠuttaVolume:
9
Language:
english
Pages:
8
DOI:
10.2478/s11534-011-0041-4
Date:
October, 2011
File:
PDF, 741 KB
english, 2011