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Removal of sulfur compounds in FCC raw C4 using activated carbon impregnated with CuCl and PdCl2
Kyu-sung Kim, Sun Hee Park, Ki Tae Park, Byung-Hee Chun, Sung Hyun KimVolume:
27
Year:
2010
Language:
english
Pages:
1
DOI:
10.2478/s11814-010-0105-y
File:
PDF, 352 KB
english, 2010