Two-mirror projection objective of a nanolithographer at λ = 13.5 nm
S. Yu. Zuev, A. E. Pestov, N. N. Salashchenko, A. S. Skryl, I. L. Stroulea, L. A. Suslov, M. N. Toropov, N. I. ChkhaloVolume:
75
Language:
english
Pages:
4
DOI:
10.3103/s1062873811010308
Date:
January, 2011
File:
PDF, 717 KB
english, 2011