Features of the formation of silicon nanocrystals upon the annealing of SiO2layers implanted with Si ions
N. N. Ovsyuk, Venu Mankad, Sanjeev K. Gupta, Prafulla K. Jha, G. A. KachurinVolume:
75
Language:
english
Pages:
4
DOI:
10.3103/s106287381105039x
Date:
May, 2011
File:
PDF, 502 KB
english, 2011