Phenomenological model of nanocrystalline silicon film...

Optoelectronics, Instrumentation and Data Processing 2009 / 08 Vol. 45; Iss. 4

Phenomenological model of nanocrystalline silicon film formation by plasma-enhanced chemical vapor deposition

P. L. Novikov, A. Le Donne, S. Cereda, L. Miglio, S. Pizzini, S. Binetti, M. Rondanini, C. Cavallotti, D. Chrastina, T. Moiseev, H. von Känel, G. Isella, F. Montalenti
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
45
Language:
english
Pages:
6
DOI:
10.3103/s8756699009040062
Date:
August, 2009
File:
PDF, 397 KB
english, 2009
Conversion to is in progress
Conversion to is failed