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Photocatalytic degradation rate of oxalic acid on a semiconductive layer of n-TiO2 particles in a batch mode plate photoreactor Part II: Light intensity limit
J. Krýsa, L. Vodehnal, J. JirkovskýVolume:
29
Language:
english
Pages:
7
DOI:
10.1023/a:1003464207063
Date:
April, 1999
File:
PDF, 136 KB
english, 1999