SiOxNy Films deposited with SiCl4 by remote plasma enhanced CVD
O. Sanchez, J. M. Martinez-Duart, R. J. Gomez-Sanroman, R. Perez-Casero, M. A. Aguilar, C. Falcony, F. Fernandez-Gutierrez, M. Hernández-VélezVolume:
34
Language:
english
Pages:
6
DOI:
10.1023/a:1004620409994
Date:
June, 1999
File:
PDF, 232 KB
english, 1999