Epitaxial Growth of Si by Low-energy DC-plasma Chemical Vapor Deposition
E. Mateeva, H. R. Deller, U. Kafader, C. Rosenblad, H. Von Känel, A. DommannVolume:
17
Language:
english
Pages:
3
DOI:
10.1023/a:1006562315076
Date:
September, 1998
File:
PDF, 91 KB
english, 1998