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The Characteristics of Interfacial Strains Developed in Silicon by Wet O2 Oxidation
D.-W. Shin, Y.-H. You, D.-J. Choi, G.-H. KimVolume:
18
Language:
english
Pages:
3
DOI:
10.1023/a:1006664429348
Date:
May, 1999
File:
PDF, 75 KB
english, 1999