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A New Metal-Organic Precursor for the Low-Temperature Atmospheric Pressure Chemical Vapor Deposition of Zinc Oxide Films
S. Suh, D. M. Hoffman, L. M. Atagi, D. C. SmithVolume:
18
Language:
english
Pages:
3
DOI:
10.1023/a:1006689017053
Date:
May, 1999
File:
PDF, 79 KB
english, 1999