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Ductility and stress relaxation kinetics in a silicon nitride ceramic in the 1400–1650°C range
S. Testu, J.-L. Besson, T. Rouxel, G. Bernard-GrangerVolume:
19
Language:
english
Pages:
4
DOI:
10.1023/a:1006749129216
Date:
June, 2000
File:
PDF, 143 KB
english, 2000