Dependence of electromigration caused by different...

Journal of Materials Science: Materials in Electronics 1999 / 12 Vol. 10; Iss. 9

Dependence of electromigration caused by different mechanisms on current densities in VLSI interconnects

Zhi-Hong Li, Guo-Ying Wu, Yang-Yuan Wang, Zhi-Guo Li, Ying-Hua Sun
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Volume:
10
Language:
english
Pages:
7
DOI:
10.1023/a:1008916519667
Date:
December, 1999
File:
PDF, 189 KB
english, 1999
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