Silicon Surface Cleaning by Wet Etching for IC Production...

Russian Microelectronics 2001 / 05 Vol. 30; Iss. 3

Silicon Surface Cleaning by Wet Etching for IC Production in a Closed Manufacturing System

Yu. P. Snitovskii
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Volume:
30
Language:
english
Pages:
4
DOI:
10.1023/a:1011318811003
Date:
May, 2001
File:
PDF, 39 KB
english, 2001
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