The Effect of Contact Window Cleaning and Doping in BF3+ H2and BF3+ H2+ CF4Plasmas on the Mo–p+-Si Contact Resistance
Yu. P. Snitovskii, S. F. Sen'koVolume:
30
Language:
english
Pages:
4
DOI:
10.1023/a:1011948913956
Date:
September, 2001
File:
PDF, 33 KB
english, 2001