Reactive Ion-Beam Etching of Thick Polyimide Layers in an...

Russian Microelectronics 2001 / 09 Vol. 30; Iss. 5

Reactive Ion-Beam Etching of Thick Polyimide Layers in an Oxygen + Argon Mixture

A. I. Stognij, Yu. V. Timoshkov, T. I. Orekhovskaya, S. V. Koryakin, E. V. Lobko
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Volume:
30
Language:
english
Pages:
5
DOI:
10.1023/a:1011996829886
Date:
September, 2001
File:
PDF, 561 KB
english, 2001
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