Bulk and interface properties of low-temperature silicon...

Journal of Materials Science: Materials in Electronics 2001 / 09 Vol. 12; Iss. 9

Bulk and interface properties of low-temperature silicon nitride films deposited by remote plasma enhanced chemical vapor deposition

Young-Bae Park, Shi-Woo Rhee
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Volume:
12
Language:
english
Pages:
8
DOI:
10.1023/a:1012449425744
Date:
September, 2001
File:
PDF, 1.20 MB
english, 2001
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