Change in the Composition of Residual Gases in a Vacuum Chamber during Ti Film Deposition
V. I. Perekrestov, S. N. KravchenkoVolume:
45
Language:
english
Pages:
4
DOI:
10.1023/a:1016083909330
Date:
May, 2002
File:
PDF, 40 KB
english, 2002