Isotropic Plasma Etching of SiO2 Films

Russian Microelectronics 2002 / 09 Vol. 31; Iss. 5

Isotropic Plasma Etching of SiO2 Films

A. A. Kovalevskii, V. S. Malyshev, V. V. Tsybul'skii, V. M. Sorokin
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Volume:
31
Language:
english
Pages:
5
DOI:
10.1023/a:1020234924542
Date:
September, 2002
File:
PDF, 89 KB
english, 2002
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