Composition and Surface Properties of a Silicon Dioxide Film Deposited by a Plasma-Chemical Technique
V. M. Izgorodin, Yu. V. Tolokonnikov, A. A. Aushev, A. F. Kovylov, N. L. ZolotukhinaVolume:
36
Language:
english
Pages:
5
DOI:
10.1023/a:1021082927058
Date:
November, 2002
File:
PDF, 149 KB
english, 2002