Modeling of H2and H2/CH4Moderate-Pressure Microwave Plasma...

Plasma Chemistry and Plasma Processing 1998 / 09 Vol. 18; Iss. 3

Modeling of H2and H2/CH4Moderate-Pressure Microwave Plasma Used for Diamond Deposition

K. Hassouni, O. Leroy, S. Farhat, A. Gicquel
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Volume:
18
Language:
english
Pages:
38
DOI:
10.1023/a:1021845402202
Date:
September, 1998
File:
PDF, 1.75 MB
english, 1998
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