Chemical Composition of Boron Carbonitride Films Grown by Plasma-Enhanced Chemical Vapor Deposition from Trimethylamineborane
M. L. Kosinova, Yu. M. Rumyantsev, A. N. Golubenko, N. I. Fainer, B. M. Ayupov, I. P. Dolgovesova, B. A. Kolesov, V. V. Kaichev, F. A. KuznetsovVolume:
39
Language:
english
Pages:
8
DOI:
10.1023/a:1023227716045
Date:
April, 2003
File:
PDF, 117 KB
english, 2003