Plasma Enhanced Chemical Vapor Deposition of Fluorinated...

Plasmas and Polymers 1998 / 06 Vol. 3; Iss. 2

Plasma Enhanced Chemical Vapor Deposition of Fluorinated Amorphous Carbon Thin Films from Tetrafluoroethylene and Tetraisocyanatesilane

Tatsuru Shirafuji, Yuko Nakagami, Yasuaki Hayashi, Shigehiro Nishino
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Volume:
3
Language:
english
Pages:
13
DOI:
10.1023/b:papo.0000005942.82289.25
Date:
June, 1998
File:
PDF, 1.08 MB
english, 1998
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